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LPM 2005:
Please visit the new pages of the 6th International Symposium
on Laser Precision Microfabrication, held April 4-8, 2005,
in Williamsburg, Virginia, USA.
Welcome to the LPM 2003
The LPM 2003 is the fourth international symposium which focuses on reporting and discussing progress in the field of lasers and their applications in precision microfabrication. It is organized in association with the WLT conference "LIM" - Lasers in Manufacturing 2003, and in cooperation with:
The symposium is due to take place from June 21st to 24th, 2003, at the New Trade Fair in Munich (München), Germany. With a partial time overlap, the Laser 2003: World of Photonics, one of the largest international trade shows in lasers and optics, takes place on the same ground from June 23rd to 26th.
Please use the links on the upper right for information on the program, your registration, and the location of the LPM 2003. In addition, we now offer information for speakers on a separate page. To contact the organizers, please send an e-mail to: lpm2003@wlt.de.
General Chair of the LPM 2003:
· Isamu Miyamoto
(Osaka University, Japan)
Co-Chairs:
· Andreas Ostendorf (Laser Zentrum Hannover, Germany)
· Koji Sugioka (RIKEN, Japan)
· Henry Helvajian (The Aerospace Corporation, USA)
Program Committee:
· David Ashkenasi (LMTB Berlin, Germany)
· Dieter Baeuerle (Johannes Kepler University Linz, Austria)
· Boris Chichkov (Laser Zentrum Hannover, Germany)
· Jan Dubowski (NRC, Canada)
· Friedrich Dausinger (University of Stuttgart, Germany)
· Corey Dunsky (Electro Scientific Industries, USA)
· Gerd Esser (Bavarian Laser Zentrum, Germany)
· Arnold Gillner (Fraunhofer ILT, Germany)
· Malcolm Gower (Exitech Ltd., UK)
· Peter Herman (University of Toronto, Canada)
· Ingolf Hertel (Max-Born Institut Berlin, Germany)
· James Horwitz (Naval Research Laboratories, USA)
· Hideo Hosono (Tokyo Institute of Technology, Japan)
· Willem Hoving (Philips CFT, Netherlands)
· Yoshiro Ito (Nagaoka University of Technology, Japan)
· Kazuyoshi Itoh (Osaka University, Japan)
· Takahisa Jitsuno (Osaka University, Japan)
· Vitali Konov (GPI, Russia)
· C. Lee (In-Ha University, Korea)
· Y. F. Lu (University of Nebraska, USA)
· Hiroshi Masuhara (Osaka University, Japan)
· Johan Meijer (University of Twente, Netherlands)
· Simeon Metev (BIAS, Germany)
· Michel Meunier (Ecole Polytechnique Montreal, Canada)
· Hiroaki Misawa (Tokushima University, Japan)
· Hiroyuki Niino (AIST, Japan)
· Jyunji Nishii (AIST-Kansai, Japan)
· Etsuji Ohmura (Osaka University, Japan)
· Tatsuo Okada (Kyushu University, Japan)
· Toshihiko Ooie (AIST-Shikoku, Japan)
· Raj Patel (IMRA America, USA)
· Alan Petersen (Spectra Physics, USA)
· Juergen Reif (University of Cottbus, Germany)
· Uwe Stamm (XTREME Technologies GmbH, Germany)
· Michael Stuke (MPI, Germany)
· Vadim Veiko (St. Petersburg Institute of Fine Mechanics and Optics, Russia)
· Rui Vilar (University of Lisbon, Portugal)
· Kunihiko Washio (NEC, Japan)
· Xian Fan Xu (Purdue University, USA)
· Akehito Yoshida (Matsushita Electric Industrial, Japan)
Organizing Committee:
· Zhao-Gu Cheng (SIOFM, China)
· Friedrich Dausinger (University of Stuttgart, Germany)
· Gerd Esser (Bavarian Laser Zentrum, Germany)
· Burkhard Fechner (Lambda Physik, Japan)
· Jim Fieret (Exitech Ltd., UK)
· Enshi Fukumitsu (Hamamatsu Photonics, Japan)
· Arnold Gillner (Fraunhofer ILT, Germany)
· M. H. Hong (DSI, Singapore)
· Tony Hoult (Coherent Inc, USA)
· Juergen Ihlemann (Laser Laboratory Goettingen, Germany)
· Narumi Inoue (National Defence Academy, Japan)
· Takashi Ishide (Matsushita Heavy Industry, Japan)
· Shinichi Ishizaka (Japan Steel Works, Japan)
· Yoshiro Ito (Nagaoka University of Technology, Japan)
· Takahisa Jitsuno (Osaka University, Japan)
· Teruyoshi Kadoya (Trumph, Japan)
· Kazuo Kamada (Matsushita Electric Works, Japan)
· Hidehiko Karasaki (Matsushita Industrial Equipment, Japan)
· Kojiro Kobayashi (Osaka University, Japan)
· Christian Kulik (Laser Zentrum Hannover, Germany)
· William P. Latham (Air Force Research Laboratories, USA)
· J. M. Lee (Samsung Electronics, Korea)
· Simeon Metev (BIAS, Germany)
· Iroshi Miura (Shizuoka University, Japan)
· Takashi Miyoshi (Osaka University, Japan)
· Sumio Nakahara (Kansai University, Japan)
· Hirokuni Namba (Sumitomo Electric Industry, Japan)
· Hiroyuki Niino (AIST, Japan)
· Satoru Nishio (Tohoku University, Japan)
· Klaus Nowitzki (OptecNet Deutschland, Germany)
· Etsuji Ohmura (Osaka University, Japan)
· Toshihiko Ooie (AIST-Shikoku, Japan)
· Alberto Pique (Naval Research Laboratories, USA)
· Juergen Reif (University of Cottbus, Germany)
· Tomokazu Sano (Osaka University, Japan)
· Masaaki Tanaka (Mistubishi Electric, Japan)
· Osamu Wakabayashi (Gigaphoton, Japan)
· Kunihiko Washio (NEC, Japan)
· Takehiro Watanabe (Chiba University, Japan)
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